Monolithic integration of multilayer filter on vertical surface of semiconductor substrate by a bias-sputtering technique

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Abstract
The selective formation of dielectric film on a vertical surface of a substrate by a bias-sputtering technique is discussed. Using this technique it has been possible to achieve the monolithic integration of a multilayer wavelength filter and waveguide photodetector on a vertical surface of a semiconductor substrate. The wavelength filter can be applied to an integrated demultiplexer and photodetector by fabricating an optical waveguide directly on the substrate.<>