Practical cage-effect model for crosslinking in a negative chemically amplified resist and its use in comparing e-beam and optical exposure
- 1 November 1992
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 10 (6) , 2565-2569
- https://doi.org/10.1116/1.586328
Abstract
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