Modification of oxide films by ion implantation: TiO2-films modified by Ti+ and O+ as example
- 1 July 1988
- journal article
- Published by Elsevier in Electrochimica Acta
- Vol. 33 (7) , 911-925
- https://doi.org/10.1016/0013-4686(88)80088-4
Abstract
No abstract availableKeywords
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