Ion implantation distributions in inhomogeneous materials
- 15 November 1977
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 31 (10) , 649-651
- https://doi.org/10.1063/1.89511
Abstract
The integral equation for ion‐implantation range, damage, and ionization distributions in random media is generalized to allow nonuniform target materials. The generalization range equation is solved in the path‐length approximation, using power‐law cross sections, for a target consisting of two dissimilar half‐spaces. There is a discontinuity in the distribution at the interface, proportional to the value of the distribution in the material the projectile is leaving; the constant of proportionality is evaluated explicitly.Keywords
This publication has 2 references indexed in Scilit:
- Range Distribution Theory Based on Energy Distribution of Implanted IonsJournal of Applied Physics, 1972
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969