Reliability of 10 nm Stacked Insulator on Polycrystalline Silicon in Planar and Trench Capacitors
- 1 December 1990
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 137 (12) , 3942-3947
- https://doi.org/10.1149/1.2086333
Abstract
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