Optimal regime for forming topological patterns when processing films with laser radiation
- 30 November 1982
- journal article
- Published by IOP Publishing in Soviet Journal of Quantum Electronics
- Vol. 12 (11) , 1408-1411
- https://doi.org/10.1070/qe1982v012n11abeh006087
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: