Identification of carbon and tantalum chemical states in metal-doped a-C:H films
- 1 December 1988
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 36 (1-2) , 171-181
- https://doi.org/10.1016/0257-8972(88)90147-8
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Tribological and electrical properties of metal-containing hydrogenated carbon filmsApplied Physics Letters, 1987
- Stability of oxides grown on tantalum silicide surfacesJournal of Applied Physics, 1986
- An x-ray photoelectron spectroscopy study of poly(methylmethacrylate) and poly(α-methylstyrene) surfaces irradiated by excimer lasersJournal of Vacuum Science & Technology A, 1986
- Frictional properties of diamondlike carbon layersApplied Physics Letters, 1980
- Scaling theory of percolation clustersPhysics Reports, 1979
- Orbach type reorientation processes in the paraelastic relaxation of O2− in KClJournal of Physics and Chemistry of Solids, 1970
- THE VARIATION OF LATTICE PARAMETER WITH CARBON CONTENT OF TANTALUM CARBIDE1The Journal of Physical Chemistry, 1961