Integrated flux concentrator improves CMOS magnetotransistors
- 24 August 2005
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Metallic microstructures fabricated using photosensitive polyimide electroplating moldsJournal of Microelectromechanical Systems, 1993
- Dual collector magnetotransistors with on-chip bias and signal conditioning circuitrySensors and Actuators A: Physical, 1993
- A Comparison of DC and Pulsed Fe‐Ni Alloy DepositsJournal of the Electrochemical Society, 1993
- Electrodeposition of Thin Films of Nickel‐Iron: II . ModelingJournal of the Electrochemical Society, 1993
- Analysis of Domain Structure and Permeability of Electrodeposited NiFe Strip FilmsJournal of the Electrochemical Society, 1993
- A lateral magnetotransistor structure with a linear response to the magnetic fieldIEEE Transactions on Electron Devices, 1989
- Electrodeposition of Magnetic MaterialsJournal of Applied Physics, 1962