Structural characterization of NbCN thin films
- 1 March 1981
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science and Technology
- Vol. 18 (2) , 259-261
- https://doi.org/10.1116/1.570737
Abstract
Reactively sputtered films of NbCxN1−x have been characterized by x-ray diffraction measurements of the unit cell size, mean crystallite dimensions, relative degree of crystallite perfection, and preferred orientation. Large structural variations could be seen in these films which were reproducible functions of the preparation conditions.Keywords
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