Low-energy (5<E i<100 eV), high-brightness, ultrahigh vacuum ion source for primary ion beam deposition: Applications for Al and Ge
- 1 November 1995
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 13 (6) , 2836-2842
- https://doi.org/10.1116/1.579714
Abstract
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