Heater for high T c oxide superconducting thin-film deposition

1 December 1991

journal article
letter
Published by AIP Publishing in Review of Scientific Instruments

Vol. 62 (12) , 3104-3105
https://doi.org/10.1063/1.1142163

Abstract

A design for a heater stage capable of operating in a high oxygen partial pressure is presented. Substrates attached to the stage may be heated up to 900 °C in oxygen partial pressures from 10⁻³ to 760 Torr. The design of the heater allows easy replacement of all parts.

Keywords

HIGH−TC SUPERCONDUCTORS
DEPOSITION
HEATERS
DESIGN
HIGH TEMPERATURE
SAMPLE HOLDERS
SUBSTRATES
SUPERCONDUCTING FILMS
THIN FILMS
VAPOR DEPOSITED COATINGS
FABRICATION

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