Simulation of focused ion beam milling
- 31 December 1986
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 5 (1-4) , 481-489
- https://doi.org/10.1016/0167-9317(86)90081-x
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Redeposition in ion millingMicroelectronic Engineering, 1987
- Influence Of Sputter Effects On The Resolution In X-Ray Mask RepairPublished by SPIE-Intl Soc Optical Eng ,1986
- COMPOSITE -- A Complete Modeling Program of Silicon TechnologyIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 1985
- Untersuchungen zur Festkörperzerstäubung bei schiefwinkligem Ionenbeschuß polykristalliner Metalloberflächen im Energiebereich um 1 keVThe European Physical Journal A, 1973