High Aspect Pattern Fabrication by Nano Imprint Lithography Using Fine Diamond Mold

• 30 June 2003
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 42  (Part 1, No) , 3863-3866
• https://doi.org/10.1143/jjap.42.3863

Abstract

Keywords

• NANOLITHOGRAPHY
• PATTERN FORMATION
• DEVELOPMENT PROCESS
• HIGH ASPECT RATIO
• SURFACE TENSION