Buried SiO2 Films: Interfaces and Defects

• 1 January 1997
• journal article
• Published by Trans Tech Publications, Ltd. in Materials Science Forum
• Vol. 239-241, 1-6
• https://doi.org/10.4028/www.scientific.net/msf.239-241.1

Abstract

Keywords

• BURIED OXIDE
• ELECTRON SPIN RESONANCE
• POINT DEFECT
• SILICON OXIDE (SIO)
• SILICON-ON-INSULATOR (SOI)