The modeling of resistive interconnects for integrated circuits
- 1 April 1983
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Solid-State Circuits
- Vol. 18 (2) , 200-203
- https://doi.org/10.1109/jssc.1983.1051922
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Interconnection delays in MOSFET VLSIIEEE Journal of Solid-State Circuits, 1981
- 1 /spl mu/m MOSFET VLSI technology. VII. Metal silicide interconnection technology - A future perspectiveIEEE Journal of Solid-State Circuits, 1979
- Accurate metallization capacitances for integrated circuits and packagesIEEE Journal of Solid-State Circuits, 1973