New nondestructive depth profile measurement by using a refracted x-ray fluorescence method
- 1 April 1991
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 58 (13) , 1384-1386
- https://doi.org/10.1063/1.104315
Abstract
We demonstrated analysis of the nondestructive depth profile near the surface of As ion-implanted Si substrate by using the refracted x-ray fluorescence method. Experimental results show that the angular distribution of the measured x-ray fluorescence is dependent on the surface roughness of the substrate.Keywords
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