Ta3N5 and TaON Thin Films on Ta Foil: Surface Composition and Stability
- 8 November 2003
- journal article
- research article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry B
- Vol. 107 (48) , 13441-13445
- https://doi.org/10.1021/jp036189t
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Conduction and Valence Band Positions of Ta2O5, TaON, and Ta3N5 by UPS and Electrochemical MethodsThe Journal of Physical Chemistry B, 2003
- LaTiO2N as a Visible-Light (≤600 nm)-Driven Photocatalyst (2)The Journal of Physical Chemistry B, 2002
- Ta3N5 as a Novel Visible Light-Driven Photocatalyst (λ<600 nm)Chemistry Letters, 2002
- Photoreactions on LaTiO2N under Visible Light IrradiationThe Journal of Physical Chemistry A, 2002
- Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputteringApplied Physics A, 2001
- The electronic structure of tantalum (oxy)nitrides TaON and Ta3N5Journal of Materials Chemistry, 2001
- Effect of lanthanide-doping into NaTaO3 photocatalysts for efficient water splittingChemical Physics Letters, 2000
- Inorganic yellow-red pigments without toxic metalsNature, 2000
- Oxide semiconductors in photoelectrochemical conversion of solar energySolar Energy, 1980