In situ production of sputtered epitaxial HoBa2Cu3O7-x thin films
- 30 November 1990
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 76 (5) , 697-700
- https://doi.org/10.1016/0038-1098(90)90118-u
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Spatial imaging of the critical current density in epitaxial Y1Ba2Cu3O7 filmsApplied Physics Letters, 1989
- Direct production and properties of sputtered epitaxial YBa2Cu3O7 thin and ultrathin films on (100) and (110) SrTiO3Journal of the Less Common Metals, 1989
- I n s i t u formation of superconducting YBa2Cu3O7−x thin films using pure ozone vapor oxidationApplied Physics Letters, 1988
- Low-temperature preparation of superconducting YBa2Cu3O7−δ films on Si, MgO, and SrTiO3 by thermal coevaporationApplied Physics Letters, 1988
- Direct production of crystalline superconducting thin films of YBa2Cu3O7 by high-pressure oxygen sputteringSolid State Communications, 1988
- I n s i t u preparation of Y-Ba-Cu-O superconducting thin films by magnetron sputteringApplied Physics Letters, 1988