Anhydrous Metal Nitrates as Volatile Single Source Precursors for the CVD of Metal Oxide Films

• 1 December 1998
• journal article
• research article
• Published by Wiley in Chemical Vapor Deposition
• Vol. 04  (06) , 220-222
• https://doi.org/10.1002/(sici)1521-3862(199812)04:06<220::aid-cvde220>3.0.co;2-e

Abstract

Keywords

• OPTIMIZATION
• VOLATILE
• MOCVD
• SINGLE SOURCE
• METAL NITRATES
• ANHYDROUS METAL