Noncharacteristic Defects in Thin Films of Cobalt Ferrites
- 1 November 1970
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 41 (12) , 4885-4889
- https://doi.org/10.1063/1.1658557
Abstract
High‐voltage transmission electron microscopy has been used to study the structure of thin films of cobalt ferrites of various compositions. Small defects have been identified to result from a combination of chemical polishing used to prepare foils and subsequent radiation damage in the electron microscope. Such defects must be distinguished from the characteristic defects, such as small precipitates, since they are representative only of the preparation and examination techniques.This publication has 7 references indexed in Scilit:
- Electron displacement damage in copper and aluminium in a high voltage electron microscopePhilosophical Magazine, 1968
- Electron microscopy at high voltagesPhilosophical Magazine, 1968
- Defects in spinel crystals grown by the verneuil processPhilosophical Magazine, 1966
- Direct observation of radiation damage produced in copper, gold and aluminum during ion bombardments at low temperatures in the electron microscopeActa Metallurgica, 1966
- Electron Diffraction Contrast of Small Stacking Fault Tetrahedra with Applications to Quenched GoldPhysica Status Solidi (b), 1966
- Zur Deutung der elektronenmikroskopischen Kontrasterscheinungen an Fehlstellenagglomeraten in neutronenbestrahltem KupferPhysica Status Solidi (b), 1965
- Diffraction contrast from spherically symmetrical coherency strainsPhilosophical Magazine, 1963