Remote plasma enhanced chemical vapor deposition of GaP with in situ generation of phosphine precursors
- 1 May 1992
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 10 (3) , 1070-1073
- https://doi.org/10.1116/1.586079
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: