First Principles Study of Atomic-Scale Al2O3 Films as Insulators for Magnetic Tunnel Junctions
- 1 May 2000
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 39 (5B) , L479
- https://doi.org/10.1143/jjap.39.l479
Abstract
We performed density-functional calculations with Al/Al2O3/Al structures as models to study Al2O3 tunnel barriers for magnetic tunnel junctions. We found that aluminum oxide films thicker than 4.6 Å have pseudogaps without substantial gap states, which suggests that these films have good insulating properties. This finding is consistent with an experimental result where a large magnetoresistance ratio was attained with a film thickness of about 8 Å.Keywords
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