Preferred orientations in MgO films deposited on amorphous substrates
- 15 April 1974
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 24 (8) , 347-349
- https://doi.org/10.1063/1.1655210
Abstract
Reflection high‐energy electron diffraction patterns show that the crystal orientation of MgO films deposited on amorphous substrates at 30 °C at normal vapor incidence varies with film thickness. Films in the thickness range of 50 Å to less than 1000 Å have a random orientation. As the film thickness is increased a 〈 111 〉 preferred orientation develops. The 〈 111 〉 preferred orientation remains unchanged upon annealing in vacuum at a temperature in the range from 400 to 550 °C for 1 h. The origin of these orientations is discussed.This publication has 3 references indexed in Scilit:
- Crystal Structure of Evaporated MgO Films on Amorphous and Polycrystalline SubstratesJournal of Vacuum Science and Technology, 1973
- Crystal growth and orientation in deposits condensed from the vapourActa Crystallographica, 1952
- The Structure and Growth of Evaporation LiF and NaCl Films on Amorphous SubstratesThe Journal of Chemical Physics, 1949