Diamond-Like Carbon Film Deposition by Super-Wide Electron-Cyclotron Resonance Plasma Source Excited by Traveling Microwave
- 1 June 1993
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 32 (6A) , L802
- https://doi.org/10.1143/jjap.32.l802
Abstract
An electron-cyclotron resonance (ECR) plasma source which generates a long and narrow plasma 500 mm in length has been developed. The plasma is generated by a 2.45 GHz traveling microwave which is supplied through a slot antenna prepared in the waveguide in a magnetic field generated by permanent magnets. Diamond-like carbon (DLC) films were deposited in a wide zone 340 mm in width. The variation of film thickness was less than 10%. The resistivity of the DLC film was ∼9.62×1011 Ω·cm and permittivity, 3.63. The prepared Al/DLC/Si metal/insulator/semiconductor (MIS) diode revealed fairly good field effect in its capacitance-voltage curve.Keywords
This publication has 2 references indexed in Scilit:
- Effects of Oxygen Addition on Diamond Film Growth by Electron-Cyclotron-Resonance Microwave Plasma CVD ApparatusJapanese Journal of Applied Physics, 1991
- Large Area Chemical Vapour Deposition of Diamond Particles and Films Using Magneto-Microwave PlasmaJapanese Journal of Applied Physics, 1987