The role of oxygen excitation and loss in plasma-enhanced deposition of silicon dioxide from tetraethylorthosilicate
- 1 January 1992
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 10 (1) , 37-45
- https://doi.org/10.1116/1.586361
Abstract
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