Plasma polymerization anda-C:H film ablation in microwave discharges in methane diluted with argon and hydrogen
- 1 September 1990
- journal article
- Published by Springer Nature in Plasma Chemistry and Plasma Processing
- Vol. 10 (3) , 451-471
- https://doi.org/10.1007/bf01447203
Abstract
No abstract availableKeywords
This publication has 35 references indexed in Scilit:
- Diamond and diamondlike films: Deposition processes and propertiesJournal of Vacuum Science & Technology A, 1989
- Preparation of amorphous i-C films by ion-assisted methodsThin Solid Films, 1989
- Diamond—Ceramic Coating of the FutureJournal of the American Ceramic Society, 1989
- Low-Pressure, Metastable Growth of Diamond and "Diamondlike" PhasesScience, 1988
- Chemical erosion of graphite by hydrogen impact: A summary of the database relevant to diamond film growthJournal of Vacuum Science & Technology A, 1988
- Process monitoring of a-C:H plasma depositionJournal of Vacuum Science & Technology A, 1987
- A review of the present state of art in hard coatings grown from the vapor phaseJournal of Vacuum Science & Technology A, 1986
- rf-plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applicationsJournal of Applied Physics, 1983
- Survey of low temperature rf plasma polymerization and processingJournal of Vacuum Science and Technology, 1976
- Plasma Polymerization of Saturated and Unsaturated HydrocarbonsMacromolecules, 1974