Magnetic anisotropy and strain states of (001) and (110) colossal magnetoresistance thin films

The magnetic anisotropy of epitaxial colossal magnetoresistance films on ${\mathrm{SrTiO}}_{\mathrm{3}}$ substrates is dominated by the strain or magnetocrystalline anisotropy depending on the orientation of the film. While the magnetic anisotropy of (001) films is determined by magnetocrystalline anisotropy, that of (110) films is determined by magnetoelastic effects. Furthermore while the microstructure in the thin films has a significant effect on the coercive field, it has a correspondingly negligible effect on the magnetic anisotropy. We find a roughening surface morphology with increasing thickness that is more pronounced in (110) oriented films and can be attributed to the growth kinetics.