On the mechanical properties of uhv-deposited Cr films and their dependence on substrate temperature, oxygen pressure and substrate material
- 1 January 1990
- Vol. 41 (4-6) , 1300-1301
- https://doi.org/10.1016/0042-207x(90)93939-g
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Internal stress of thin silver, copper, gold and chromium films—a comparisonVacuum, 1983
- The influence of O2, H2, H2O, N2, CO and CH4 on the structure of thin silver films investigated by ultrahigh vacuum internal stress measurementsThin Solid Films, 1982
- Structure and internal stress in ultra-thin silver films deposited on MgF2 and SiO substratesThin Solid Films, 1978
- Stresses in thin films: The relevance of grain boundaries and impuritiesThin Solid Films, 1976
- Grain Growth and Stress Relief in Thin FilmsJournal of Vacuum Science and Technology, 1972
- Intrinsic Stress in Evaporated Metal FilmsJournal of the Electrochemical Society, 1968