In-situ doping of silicon using the gas immersion laser doping (GILD) process
Open Access
- 1 December 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 43 (1-4) , 325-332
- https://doi.org/10.1016/0169-4332(89)90234-1
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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