Electrode material and geometry effects on the formation and electrical properties of particle traps in a plasma etch system

Abstract
Langmuir probemeasurements of the near‐sheath plasma region in a plasmaetch system reveal that geometric discontinuities in the powered electrode surface lead to areas of elevated plasma potential. Particles trapped in the plasma in these regions are also observed optically using laser light scattering and video detection. Electrodematerialdiscontinuities are also shown to affect the plasma potential and particle traps. Maps of plasma potential are presented for plasmas above various electrode configurations.

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