Theoretical considerations on the sensitivities of electron beam resists

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Abstract
A theoretical study has been carried out in order to explain the sensitivities of electron beam and X‐ray resists. A preliminary investigation reveals that the behavior of these resists, on irradiation by high energy radiation, may be considered to be the electronically‐excited species in the polymer. To elucidate the chemical reactions in the excited states the adiabatic potential curves are calculated by the INDO/S procedure, which considers all the valence electrons and all the singly excited electronic configurations. Polyethylene and polyisobutylene were chosen as representative of crosslinkable and degradable polymers, respectively, since there is a parallelism between the beam sensitivity of resists and the effects of high energy radiation on polymers. Polyisobutylene has many antibonding curves favorable for the main chain scission in the excited states and polyethylene does not except for one improbable state. It was concluded that degradability is explainable by the ease of bond fission in the excited states; the crosslinkability is considered to be nondegradable property.