Polarizer–surface-analyzer null ellipsometry for film–substrate systems*
- 1 December 1975
- journal article
- Published by Optica Publishing Group in Journal of the Optical Society of America
- Vol. 65 (12) , 1464-1471
- https://doi.org/10.1364/josa.65.001464
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 10 references indexed in Scilit:
- Design of film–substrate single-reflection retarders*Journal of the Optical Society of America, 1975
- Ellipsometric function of a film–substrate system: Applications to the design of reflection-type optical devices and to ellipsometry*Journal of the Optical Society of America, 1975
- Analysis of systematic errors in rotating-analyzer ellipsometers*Journal of the Optical Society of America, 1974
- Design and operation of an automated, high-temperature ellipsometerJournal of the Optical Society of America, 1974
- A new type of precision ellipsometer without employing a compensatorOptics Communications, 1974
- Design and Operation of ETA, an Automated EllipsometerIBM Journal of Research and Development, 1973
- Fourier transform detection system for rotating-analyzer ellipsometersOptics Communications, 1973
- A high speed precision automatic ellipsometerSurface Science, 1969
- Determination of the Properties of Films on Silicon by the Method of EllipsometryJournal of the Optical Society of America, 1962
- The Optical Constants of Several Metals in Vacuum*Journal of the Optical Society of America, 1936