Validity of the Fowler-Nordheim parameters measured for silicon adsorption on single crystal faces of tungsten
- 1 December 1973
- journal article
- Published by Elsevier in Surface Science
- Vol. 40 (3) , 470-478
- https://doi.org/10.1016/0039-6028(73)90138-6
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
- The anomalous Fowler-Nordheim plots of a tungsten field emitter covered with siliconSurface Science, 1972
- Adsorbate-induced work function changesSurface Science, 1972
- General features of field emission from semiconductorsPhysica Status Solidi (b), 1971
- Silicon adsorption on tungsten field emittersSurface Science, 1971
- Field emission study of selenium and tellurium thin films on a tungsten surfacePhysica Status Solidi (a), 1971
- Adsorption of uranium on tungsten single crystal planesJournal of Physics D: Applied Physics, 1971
- Die Adsorption von Silizium auf WolframAnnalen der Physik, 1966
- Adsorption of Potassium on TungstenThe Journal of Chemical Physics, 1965
- Work Function Variation of Metals Coated by Metallic FilmsJournal of Applied Physics, 1962
- Investigation of the Surface Reaction of Oxygen with Carbon on Tungsten with the Field Emission MicroscopeThe Journal of Chemical Physics, 1953