Vacuum-ultraviolet Photochemically Initiated Modification of Polystyrene Surfaces: Chemical Changes¶,‡
- 30 April 2007
- journal article
- Published by Wiley in Photochemistry and Photobiology
- Vol. 81 (4) , 777-782
- https://doi.org/10.1111/j.1751-1097.2005.tb01442.x
Abstract
No abstract availableKeywords
This publication has 22 references indexed in Scilit:
- The hydrophilization of polystyrene substrates by 172-nm vacuum ultraviolet lightJournal of Colloid and Interface Science, 2004
- Wettability control of a polymer surface through 126 nm vacuum ultraviolet light irradiationJournal of Vacuum Science & Technology A, 2004
- Photoinduced decomposition of alkyl monolayers using 172 nm vacuum ultraviolet lightJournal of Vacuum Science & Technology A, 2004
- Surface modification of polyimide with excimer UV radiation at wavelength of 126 nmThin Solid Films, 2004
- Vacuum ultraviolet-induced photochemical nitriding of polyolefin surfacesJournal of Applied Polymer Science, 2004
- Removal of oxygen atoms from a SiO 2 surface by incoherent vacuum ultraviolet excimer irradiationApplied Physics A, 2003
- Surface Modification of Vinyl Polymers by Vacuum Ultraviolet Light IrradiationJournal of Photopolymer Science and Technology, 2003
- Dielectric-Barrier Discharges: Their History, Discharge Physics, and Industrial ApplicationsPlasma Chemistry and Plasma Processing, 2003
- Spatially Defined Surface Modification of Poly(methyl methacrylate) Using 172 nm Vacuum Ultraviolet LightLangmuir, 2002
- Photolithography based on organosilane self-assembled monolayer resistElectrochimica Acta, 2001