Development of Techniques for Real‐Time Monitoring and Control in Plasma Etching: II . Multivariable Control System Analysis of Manipulated, Measured, and Performance Variables
- 1 September 1991
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 138 (9) , 2727-2735
- https://doi.org/10.1149/1.2086044
Abstract
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