Deposition of nanostructured thin films using an inductively coupled plasma chemical vapor deposition technique
- 31 December 2004
- journal article
- Published by Elsevier in Ceramics International
- Vol. 30 (7) , 1869-1872
- https://doi.org/10.1016/j.ceramint.2003.12.053
Abstract
No abstract availableKeywords
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