Dynamic control of reactive magnetron sputtering: A theoretical analysis
- 1 April 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 186 (1) , 129-136
- https://doi.org/10.1016/0040-6090(90)90506-9
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- The formation and control of direct current magnetron discharges for the high-rate reactive processing of thin filmsJournal of Vacuum Science & Technology A, 1989
- Pressure stability in reactive magnetron sputteringThin Solid Films, 1988
- Downstream pressure control: Calculation of the transfer function and optimization of control parameters leading to a new controller designJournal of Vacuum Science & Technology A, 1986
- Partial pressure control of reactively sputtered titanium nitrideJournal of Vacuum Science & Technology A, 1985
- Optical spectroscopy for diagnostics and process control during glow discharge etching and sputter depositionJournal of Vacuum Science and Technology, 1978