Vapor Pressures of Precursors for the Chemical Vapor Deposition of Silicon-Based Films

• 16 January 2004
• journal article
• research article
• Published by Wiley in Chemical Vapor Deposition
• Vol. 10  (1) , 20-22
• https://doi.org/10.1002/cvde.200306145

Abstract

Keywords

• COATINGS
• PRECURSORS
• SILICON