Electron beam lithography digital pattern generator and electronics for generalized curvilinear structures

Abstract
A vector scan pattern generator, optimized for smooth curvilinear as well as rectilinear primitive shapes, has been designed and constructed. The pattern generator uses high‐speed hardware to implement a set of second‐order, quadratic equations to drive digital to analog converters and high‐speed array processors to calculate the coefficients for these equations. The digital pattern generator package contains the high‐speed digital, analog, and high‐resolution analog electronics. The initial lithography results confirm the operation of the system and stepping rates of 40 MHz have been achieved.

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