Computer Simulation Of Substrate Defect Propagation In Thin Films

2 February 1988

proceedings article
Published by SPIE-Intl Soc Optical Eng

Vol. 0821, 133-151
https://doi.org/10.1117/12.941851

Abstract

A thin-film growth simulation of the type first introduced by Henderson et. al.¹ is applied to defect propagation in thin films. Film growth is simulated on substrates having sinusoidally varying surfaces. The surfaces of the simulated films are then characterized by their power spectrum and their correlation with the substrate surface. The effects of film thickness as well as substrate sinusoid variation period and amplitude are investigated.

Keywords

COMPUTING SYSTEMS
SIMULATIONS
THIN FILMS
THIN FILM GROWTH

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