Validity of simplified Shockley-Read-Hall statistics for modeling carrier lifetimes in crystalline silicon
- 7 February 2003
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 67 (7) , 075203
- https://doi.org/10.1103/physrevb.67.075203
Abstract
The Shockley-Read-Hall model, in its simplest and most common form, is often used to describe both injection- and temperature-dependent carrier lifetime measurements. Such lifetime modeling has provided the basis for ultrasensitive spectroscopic techniques for the study of recombination centers in crystalline silicon. However, this approximate model is only valid when the density of recombination centers is small enough to avoid trapping effects, which cause distortions in the excess mobile carrier concentrations. In this work, the simplified Shockley-Read-Hall model is compared with a more general solution of the continuity equations that takes account of carrier trapping. This comparison leads to an expression for the upper limit on the recombination center density for which the simplified Shockley-Read-Hall model remains accurate. The limit depends not only on the dopant density, but also on the energy level and electron and hole capture cross sections for a given type of recombination center. The results allow experimental conditions that do not invalidate the use of the simplified Shockley-Read-Hall model to be determined.Keywords
This publication has 26 references indexed in Scilit:
- Lifetime spectroscopy for defect characterization: Systematic analysis of the possibilities and restrictionsJournal of Applied Physics, 2002
- Capture cross sections of the acceptor level of iron–boron pairs in p-type silicon by injection-level dependent lifetime measurementsJournal of Applied Physics, 2001
- Electronic properties of light-induced recombination centers in boron-doped Czochralski siliconJournal of Applied Physics, 1999
- Injection level dependence of the defect-related carrier lifetime in light-degraded boron-doped Czochralski siliconApplied Physics Letters, 1998
- Quantitative evaluation of bulk-diffused metal contamination by lifetime techniquesMaterials Science and Engineering: B, 1998
- Temperature and injection dependence of the Shockley–Read–Hall lifetime in electron-irradiated p-type siliconJournal of Applied Physics, 1998
- Recombination at the silicon nitride/silicon interfaceJournal of Vacuum Science & Technology A, 1997
- Temperature and injection dependence of the Shockley–Read–Hall lifetime in electron irradiated n-type siliconJournal of Applied Physics, 1996
- On the recombination behaviour of iron in moderately boron-doped p-type siliconApplied Physics A, 1996
- A fast, preparation-free method to detect iron in siliconJournal of Applied Physics, 1990