Reflectance of an absorbing substrate for incident light of arbitrary polarization: appearance of a secondary maximum at oblique incidence
- 1 October 1988
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 27 (19) , 4034-4037
- https://doi.org/10.1364/ao.27.004034
Abstract
The reflectance of an absorbing substrate Rθ(ϕ) is considered as a function of the angle of incidence ϕ and an incident polarization parameter θ, where cos2θ and sin2θ give the power fractions of incident radiation that are p-and s-polarized, respectively. Taking GaAs as an example, we find that at certain wavelengths (e.g., 0.248 and 0.620 μm), the Rθ vs ϕ curve becomes oscillatory in a narrow range of θ > 45° with an unexpected secondary maximum appearing at oblique incidence. The extrema of the function Rθ(ϕ) are determined numerically, and their angular positions and reflectance levels are plotted vs θ for GaAs at photon energies of 1, 2, and 5 eV.Keywords
This publication has 4 references indexed in Scilit:
- Dielectric functions and optical parameters of Si, Ge, GaP, GaAs, GaSb, InP, InAs, and InSb from 1.5 to 6.0 eVPhysical Review B, 1983
- Stationary property of normal-incidence reflection from isotropic surfacesJournal of the Optical Society of America, 1982
- Specular Reflection and Characteristics of Reflected Light*Journal of the Optical Society of America, 1967
- Errors in using the Reflectance vs Angle of Incidence Method for Measuring Optical Constants*Journal of the Optical Society of America, 1965