Infrared Study of Process Emissions during C 3 F 8 / O 2 Plasma Cleaning of Plasma Enhanced Chemical Vapor Deposition Chambers
- 1 October 1997
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 144 (10) , 3597-3601
- https://doi.org/10.1149/1.1838054
Abstract
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