Oxidation-induced stresses in the isolation oxidation of silicon

• 1 January 2000
• journal article
• Published by Springer Nature in Journal of Engineering Mathematics
• Vol. 38  (2) , 191-218
• https://doi.org/10.1023/a:1004737420926

Abstract

Keywords

• SILICON OXIDATION
• OXIDATION-INDUCED STRESSES
• NUMERICAL FINITE DIFFERENCES
• KELLER-BOX DISCRETISATION SCHEME