Quantitative description of the growth kinetics and morphology of TiN thin films produced by a physical vapour deposition method
- 1 January 1996
- journal article
- Published by Springer Nature in Journal of Materials Science Letters
- Vol. 15 (4) , 317-319
- https://doi.org/10.1007/bf00591649
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Structure and useful properties of multi-component titanium nitride obtained by pulse plasma depositionJournal of Materials Science Letters, 1991
- On the correlation of grain geometry changes during deformation at various temperatures to the operative deformation modesPhilosophical Magazine A, 1990