Cost of ownership for x-ray proximity lithography

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Abstract
We present an analysis of the cost of ownership for a synchrotron-based x-ray proximity printing system. We consider the total number of lithography tools that would be needed for a 0.25-micron manufacturing plant with 5000 200-mm wafer starts per week. We compare the cost of x ray with that of deep ultraviolet lithography for patterning critical levels. For reference, we calculate costs for the noncritical levels as well. We examine x ray costs as functions of synchrotron under-utilization, of reticle cost and usage, and of throughput. Our analysis indicates that, under the assumptions of identical process yield and throughput, x-ray system costs with a fully utilized synchrotron are competitive with deep ultraviolet costs if the manufacturing product has high volume. For low or moderate volume products deep ultraviolet lithography is cheaper, predominantly because of lower reticle costs. The lack of a strong economic driver for x ray suggests that it is unlikely to be introduced into manufacturing until it is clear that no optical technology can adequately meet production needs.© (1994) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

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