Stable glow plasma at atmospheric pressure
- 14 May 1988
- journal article
- letter
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 21 (5) , 838-840
- https://doi.org/10.1088/0022-3727/21/5/028
Abstract
A stable glow plasma at atmospheric pressure has been achieved for plasma treatment under selected conditions, for example the structure of electrodes, the kind of dilute gas, and the frequency of power. The surface fluorination of PET film and carbon thin-film deposition by such a plasma is described here. The surface energy can be controlled by plasma treatment of various concentrations (O2/CF4/He) in the same way as the lower pressure method that has been reported by Kogoma and co-workers (1987). Active species in plasma are identified by emission spectroscopy.Keywords
This publication has 1 reference indexed in Scilit:
- Wettability control of a plastic surface by Cf4-O2plasma and its etching effectJournal of Physics D: Applied Physics, 1987