Effects of Partial Symmetry, Exposure Time, and Backward Masking on Judged Goodness and Reproduction of Visual Patterns

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Abstract
Six experiments investigated the effects of partial symmetry in visual patterns on judgement of pattern goodness, immediate memory, and learning. In Experiments 1—III pattern goodness ratings were substantially inter-correlated among a self-paced test condition and two conditions producing moderate to severe stimulus degradation (brief tachistoscopic exposure, and backward masking): the less the partial symmetry in a pattern, the lower was the judged goodness of the pattern. In Experiments IV and V immediate reproduction of patterns was observed respectively following exposures of 5–5000 ms, and backward masking. Correct reproduction improved with degree of partial symmetry. Concordant results were found in a free recall learning task (Experiment VI). Correlations between goodness and learning and memory performance for discrete patterns were always substantial. The results strongly suggest that pattern goodness can be appraised reliably and accurately with information processing times too short to permit pattern encoding in short-term visual memory. Evaluation of pattern goodness must therefore rest upon early (precategorical) processing of symmetry features.

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