Polysilicon produced by excimer (ArF) laser crystallisation and low-temperature (600°C) furnace crystallisation of hydrogenated amorphous silicon (a-Si:H)
- 1 December 1993
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 164-166, 1001-1004
- https://doi.org/10.1016/0022-3093(93)91167-2
Abstract
No abstract availableKeywords
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