A New Technique for Low Concentration Diffusion of Boron into Silicon

• 1 January 1977
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 16  (S1)
• https://doi.org/10.7567/jjaps.16s1.37

Abstract

Keywords

• SILICON
• BORON
• NEW TECHNIQUE
• CONCENTRATION DIFFUSION
• LOW CONCENTRATION